Semiconductor manufacturing apparatus

Coating apparatus – Gas or vapor deposition – Multizone chamber

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118723, 156345, C23C 1600

Patent

active

058556796

ABSTRACT:
A semiconductor manufacturing apparatus which enables, inside a vacuum, the transport of and mounting at a prescribed position of a supporting component or processing component, such as a susceptor or a shower head is provided. An electrode exchanging chamber 31, inside of which a vacuum can be generated, is provided adjacent to a process chamber 30 via a gate valve 8, an electrode up/down elevator pin 22 is provided inside the process chamber 30 for transporting a susceptor 1 or a shower head 2 to a prescribed height, and clamping mechanism 40 and 41, which hold a susceptor 1 or a shower head 2 with a prescribed torque from outside the process chamber 30.

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Zider, R. E., Semicontinuous Evaporation System, IBM Technical Disclosure Bulletin, vol. 14 No. 4, pp. 1199 and 1200, Sep. 1971.

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