Coating apparatus – Gas or vapor deposition – Multizone chamber
Patent
1996-03-21
1999-01-05
Breneman, Bruce
Coating apparatus
Gas or vapor deposition
Multizone chamber
118723, 156345, C23C 1600
Patent
active
058556796
ABSTRACT:
A semiconductor manufacturing apparatus which enables, inside a vacuum, the transport of and mounting at a prescribed position of a supporting component or processing component, such as a susceptor or a shower head is provided. An electrode exchanging chamber 31, inside of which a vacuum can be generated, is provided adjacent to a process chamber 30 via a gate valve 8, an electrode up/down elevator pin 22 is provided inside the process chamber 30 for transporting a susceptor 1 or a shower head 2 to a prescribed height, and clamping mechanism 40 and 41, which hold a susceptor 1 or a shower head 2 with a prescribed torque from outside the process chamber 30.
REFERENCES:
patent: 4824545 (1989-04-01), Arnold et al.
patent: 4895107 (1990-01-01), Yano et al.
patent: 5174881 (1992-12-01), Iwasaki et al.
patent: 5382339 (1995-01-01), Aranovich et al.
patent: 5449410 (1995-09-01), Chang et al.
patent: 5624536 (1997-04-01), Wada et al.
patent: 5650013 (1997-07-01), Yamazaki
patent: 5651867 (1997-07-01), Kokaku et al.
Zider, R. E., Semicontinuous Evaporation System, IBM Technical Disclosure Bulletin, vol. 14 No. 4, pp. 1199 and 1200, Sep. 1971.
Breneman Bruce
Lund Jeffrie R.
NEC Corporation
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