Semiconductor laminated module

Active solid-state devices (e.g. – transistors – solid-state diode – Housing or package – Multiple housings

Reexamination Certificate

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Details

C257S685000, C257S723000, C257S777000, C257S778000, C257S700000, C257S779000, C257S758000

Reexamination Certificate

active

06734541

ABSTRACT:

CROSS-REFERENCE TO RELATED APPLICATIONS
This application is based upon and claims the benefit of priority from the prior Japanese Patent Application No. 2001-184783, filed Jun. 19, 2001, the entire contents of which are incorporated herein by reference.
BACKGROUND OF THE INVENTION
1. Field of the Invention
The present invention relates to a semiconductor laminated module, for example, comprising a plurality of laminated unit packages loaded with thin film semiconductor chips that are flip-chip connected with base substrates.
2. Description of the Related Art
An example of a constitution of a semiconductor laminated module according to the prior art will be described with reference to FIG.
4
.
FIG. 4
shows a sectional view of the prior art module. The semiconductor laminated module
41
is constituted by sequentially laminating, for example, three unit packages
42
a
,
42
b
and
42
c
. For example, a semiconductor chip
44
a
having a thickness of, for example, about 100 &mgr;m is flip-chip connected to an upper surface of a base substrate
43
a
made of a glass-epoxy resin, and is bonded with a chip adhesive
45
a
such as a film-like thermosetting resin adhesive comprising, for example, an epoxy-based resin, whereby the unit package
42
a
as the lowermost layer is constituted. The semiconductor chip
44
a
is integrally bonded onto the base substrate
43
a
with a substrate adhesive
46
a
to complete the unit package
42
a
. A plurality of solder balls
47
are provided on a lower surface of the base substrate
43
a
, and they constitute connecting terminals to be connected with external devices.
On the lowermost unit package
42
a
, the unit package
42
b
as a second layer is laminated, and the unit package
42
c
as a third layer is further laminated. An upper surface of the unit package
42
c
of the third layer is covered with a base substrate
43
d
, thereby forming a laminated body of the semiconductor laminated module
41
.
During the unit packages
42
a
,
42
b
and
42
c
are laminated sequentially, they are pressured together and heated, thus sequentially bonded using substrate adhesives
46
a
,
46
b
and
46
c
such as a Prepreg composed of a thermosetting resin adhesive such as an epoxy-based resin. Thus, a three-layer laminated body is formed as shown in FIG.
4
.
The base substrate
43
d
provided on the uppermost unit package
42
c
as a cover is made from a glass-epoxy resin similarly to the base substrates
43
a
,
43
b
and
43
c
, and bonded with the substrate adhesive
46
c.
After the three unit packages
42
a
,
42
b
and
42
c
are laminated, through holes
48
a
and
48
b
are formed to penetrate the three-layer laminated body at both sides of the semiconductor chips
44
a
,
44
b
and
44
c
. Copper plating layers
49
a
and
49
b
are formed on the inside walls of the through holes
48
a
and
48
b.
When a heat-cycle test is performed on the semiconductor package
41
thus formed by laminating the unit packages
42
a
,
42
b
and
42
c
as shown in
FIG. 4
, the package
41
would be warped. This warp would cause detachment of each flip-chip connection portions between the base substrates
43
a
,
43
b
and
43
c
and the semiconductor chips
44
a
,
44
b
and
44
c
. This causes the adhesion of the laminated parts in the laminated body to be less reliable. In addition, when the semi-conductor chips
44
a
,
44
b
and
44
c
are in thin film forms, the semiconductor laminated package
41
is warped repeatedly in the heat-cycle test, which in some cases causes cracks in one or more of the semiconductor chips
44
a
to
44
c.
Considering causes of the above-mentioned prior art problems, it is evident that, after the semi-conductor chips
44
a
to
44
c
are flip-chip connected to the base substrates
43
a
to
43
c
, the warp is caused by stress occurred by a difference of thermal expansion amount between chip adhesives
45
a
to
45
c
, which are used as seal resin films for sealing lower sides of the semiconductor chips
44
a
to
44
c
, and the substrate adhesives
46
a
to
46
c
, which are used as seal resin films for sealing upper sides of the semiconductor chips
44
a
to
44
c
when the unit packages
42
a
to
42
c
are laminated. Further, it is evident that the warp is also caused by stress occurred by a difference of their elasticity modulus that varies with the temperature.
BRIEF SUMMARY OF THE INVENTION
A semiconductor laminate module according to one aspect of the present invention comprises a plurality of unit packages in which semiconductor chips are bonded to base substrates with a first adhesive; a second adhesive for forming a laminated body by bonding the plurality of unit packages to each other; a third adhesive formed to cover upper surfaces of the semiconductor chips and having substantially the same thermal expansion coefficient as that of the first adhesive; and an uppermost substrate bonded to an uppermost unit package with the second adhesive.


REFERENCES:
patent: 5838061 (1998-11-01), Kim
patent: 5969426 (1999-10-01), Baba et al.
patent: 6184577 (2001-02-01), Takemura et al.
patent: 6448665 (2002-09-01), Nakazawa et al.
patent: 6455924 (2002-09-01), Alcoe et al.
patent: 2000-124363 (2000-04-01), None
patent: 2000-252392 (2000-09-01), None

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