Semiconductor integrated circuit manufacturing method and...

Computer-aided design and analysis of circuits and semiconductor – Nanotechnology related integrated circuit design

Reexamination Certificate

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C716S030000

Reexamination Certificate

active

07383527

ABSTRACT:
A semiconductor integrated circuit manufacturing method and semiconductor integrated circuit manufacturing apparatus are provided that implement automatic placement that reflects constraints provided regarding parasitic elements and inter-element variation provided in a real-valued range. A netlist is prepared in advance, a permissible range setting process sets a permissible range relating to elements, a floor plan process creates a floor plan that satisfies the set permissible range using the netlist, an automatic placement process places elements using the created floor plan and extracts routing constraints that realize a permissible range for parasitic elements, and a routing process performs routing in accordance with the extracted routing constraints.

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English Language Abstract of JP 2003-085224.
English Language Abstract of JP 2002-093912.
English Language Abstract of JP 2004-178285.
English Language Abstract of JP 10-092938.
U.S. Appl. No. 11/202,863 to Shimura, filed Aug. 19, 2005.

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