Semiconductor integrated circuit device

Active solid-state devices (e.g. – transistors – solid-state diode – Field effect device – Having insulated electrode

Reexamination Certificate

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Details

C257S377000, C257S382000, C257S384000, C257S393000, C257S903000, C257S904000, C438S630000, C438S682000

Reexamination Certificate

active

07045864

ABSTRACT:
A semiconductor integrated circuit device, e.g., a memory cell of an SRAM, is formed of a pair of inverters having their input and output points connected in a crisscross manner and being formed of drive n-channel MISFETs and load p-channel MISFETs. The n-channel MISFETs and p-channel MISFETs have their back gates supplied with power supply voltage and a ground voltage, respectively. The MISFETs are formed with a metal silicide layer on the gate electrodes G and source regions (hatched areas) and without the formation of a metal silicide layer on the drain regions, respectively, whereby the leakage current of the MISFETs due to a voltage difference between the drain regions and wells can be reduced, and, thus, the power consumption can be reduced.

REFERENCES:
patent: 5159416 (1992-10-01), Kudoh
patent: 5350933 (1994-09-01), Yoshihara
patent: 5521860 (1996-05-01), Ohkubo
patent: 5578854 (1996-11-01), Chen et al.
patent: 5777920 (1998-07-01), Ishigaki et al.
patent: 6178110 (2001-01-01), Hayashi
patent: 6686274 (2004-02-01), Shimazu et al.
patent: 9-199720 (1997-07-01), None

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