Semiconductor device manufacturing: process – Making field effect device having pair of active regions... – Having schottky gate
Reexamination Certificate
2010-02-26
2010-12-21
Fahmy, Wael M (Department: 2891)
Semiconductor device manufacturing: process
Making field effect device having pair of active regions...
Having schottky gate
C438S167000, C438S191000, C438S604000, C438S606000, C257SE21403, C257SE21407
Reexamination Certificate
active
07855108
ABSTRACT:
A Si(1-x)MxC material for heterostructures on SiC can be grown by CVD, PVD and MOCVD. SIC doped with a metal such as Al modifies the bandgap and hence the heterostructure. Growth of SiC Si(1-x)MxC heterojunctions using SiC and metal sources permits the fabrication of improved HFMTs (high frequency mobility transistors), HBTs (heterojunction bipolar transistors), and HEMTs (high electron mobility transistors).
REFERENCES:
patent: 2004/0256613 (2004-12-01), Oda et al.
Aumer Michael E.
Berghmans Andre
Kahler David
Knuteson David J.
Singh Narsingh B.
Andrews & Kurth LLP
Fahmy Wael M
Northrop Grumman Systems Corporation
Yang Minchul
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