Semiconductor dynamic random access memory cell free from leakag

Static information storage and retrieval – Systems using particular element – Semiconductive

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365149, 257 57, G11C 1300

Patent

active

054385415

ABSTRACT:
A storage capacitor incorporate in a semiconductor dynamic random access memory cell has an accumulating electrode of p-type polysilicon electricaly conencted to an n-type drain region of an associated switching transistor, a dielectric film structure covering the accumulating electrode and a counter electrode opposed through the dielectric film structure and formed of a p-type polysilicon, and the dielectric film structure is thinner than a critical thickness for a direct tunneling current by virtue of the wide potential barrier between the dielectric film structure and the p-type polysilicon and the Fermi level of the p-type polysilicon falling into the forbidden band of the other p-type polyslicon.

REFERENCES:
patent: 5278428 (1994-01-01), Yamada et al.

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