Semiconductor devices and methods for manufacturing the same

Semiconductor device manufacturing: process – Coating of substrate containing semiconductor region or of... – Insulative material deposited upon semiconductive substrate

Reexamination Certificate

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C438S786000, C438S787000, C257SE21293

Reexamination Certificate

active

07452830

ABSTRACT:
Semiconductor devices and methods for manufacturing the same are disclosed. An example method includes loading a first substrate to be provided with an oxynitride layer along with a second substrate having a nitride layer in a boat, and forming the oxynitride layer on the first substrate by placing the boat into a furnace and thermally treating the boat under an oxygen atmosphere.

REFERENCES:
patent: 6495476 (2002-12-01), Lee et al.
patent: 2005/0164444 (2005-07-01), Burnham et al.

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