Semiconductor device with resistor pattern and method of...

Active solid-state devices (e.g. – transistors – solid-state diode – Integrated circuit structure with electrically isolated... – Passive components in ics

Reexamination Certificate

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C257S536000, C257S350000, C257S904000, C257SE27016

Reexamination Certificate

active

08030738

ABSTRACT:
Disclosed is a semiconductor device with a resistor pattern and methods of fabricating the same. Embodiments of the present invention provide a method of fabricating a resistor pattern having high sheet resistance by using a polycide layer for a gate electrode in a semiconductor device with the resistor pattern. Embodiments of the invention also provide a semiconductor device with a resistor pattern that is formed narrower than the minimum line width that can be defined in a photolithographic process so that sheet resistance thereof increases, and a method of fabricating the same.

REFERENCES:
patent: 5187559 (1993-02-01), Isobe et al.
patent: 5554873 (1996-09-01), Erdeljac et al.
patent: 5700717 (1997-12-01), Nowak et al.
patent: 5852311 (1998-12-01), Kwon et al.
patent: 5959343 (1999-09-01), Harada et al.
patent: 6004841 (1999-12-01), Chang et al.
patent: 2003/0030097 (2003-02-01), Lee et al.
patent: 2003/0047782 (2003-03-01), Hasegawa et al.
patent: 1999-002760 (1999-01-01), None
English language abstract of Korean Publication No. 1999-002760, Jan. 15, 1999.

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