Semiconductor device with metal wire layer masking

Active solid-state devices (e.g. – transistors – solid-state diode – Field effect device – Having insulated electrode

Reexamination Certificate

Rate now

  [ 0.00 ] – not rated yet Voters 0   Comments 0

Details

C257S131000, C257S156000, C257S340000, C257S376000

Reexamination Certificate

active

09208105

ABSTRACT:
An object of the present invention is to provide a semiconductor device capable of radiating electron-beams only to a desired region without forming a layer for restricting the radiating rays. A source electrode22made of aluminum prevents the generation of bremsstrahlung even when the electron-beams are radiated to the source electrode in a exposed condition. Also, the source electrode having an opening25at above of a crystal defect region11is used as a mask when the electron-beams are radiated thereto. That is the source electrode made of aluminum can be used both as a wiring and a mask for the radiating rays.

REFERENCES:
patent: 4134778 (1979-01-01), Sheng et al.
patent: 4682195 (1987-07-01), Yilmaz
patent: 4752818 (1988-06-01), Kushida et al.
patent: 5025293 (1991-06-01), Seki
patent: 5075751 (1991-12-01), Tomii et al.
patent: 5169793 (1992-12-01), Okabe et al.
patent: 5539244 (1996-07-01), Mori et al.
patent: 5644148 (1997-07-01), Kinzer
patent: 5808352 (1998-09-01), Sakamoto
patent: 5981981 (1999-11-01), Takahashi
patent: 0 213 972 (1987-03-01), None
patent: 51-46882 (1976-04-01), None
patent: 54-002076 (1979-01-01), None
patent: 54-2076 (1979-01-01), None
patent: 54-53873 (1979-04-01), None
patent: 55-154767 (1980-12-01), None
patent: 62-54961 (1987-03-01), None
patent: 62-298120 (1987-12-01), None
patent: 64-19771 (1989-01-01), None
patent: 1-235272 (1989-09-01), None
patent: 1-287965 (1989-11-01), None
patent: 2-196471 (1990-08-01), None
patent: 3-259537 (1991-11-01), None
patent: 4-229661 (1992-08-01), None
patent: 7-135214 (1995-05-01), None
patent: 7-297414 (1995-11-01), None
patent: 2526653 (1996-06-01), None
patent: 8-227895 (1996-09-01), None
patent: 2858404 (1998-12-01), None
Esaki, et al., “A 900 MHz 100 W VD-Mosfet with Silicide Gate Self-aligned Channel”, International Electron Devices Meeting. Technical Digest, Dec. 1984, pp. 447-450.
Akiyama, et al., “Partial Lifetime Control in IFBT by Helium Irradiation Through Mask Patterns”, Power Semiconductor Devices and ICS, 1991. International Symposium on Baltimore, MD, USA Apr. 22-24, 1991, New York, NY, USA, IEEE, US, Apr. 22, 1991, pp. 187-191.
Notice of Reasons for Refusal issued in counterpart Japanese application No. H09-071056, Feb. 19, 2007, pp. 1-4 (with its full English Translation).

LandOfFree

Say what you really think

Search LandOfFree.com for the USA inventors and patents. Rate them and share your experience with other people.

Rating

Semiconductor device with metal wire layer masking does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Semiconductor device with metal wire layer masking, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Semiconductor device with metal wire layer masking will most certainly appreciate the feedback.

Rate now

     

Profile ID: LFUS-PAI-O-3894719

  Search
All data on this website is collected from public sources. Our data reflects the most accurate information available at the time of publication.