Active solid-state devices (e.g. – transistors – solid-state diode – Specified wide band gap semiconductor material other than... – Diamond or silicon carbide
Reexamination Certificate
2008-05-25
2011-11-01
Sefer, A. (Department: 2893)
Active solid-state devices (e.g., transistors, solid-state diode
Specified wide band gap semiconductor material other than...
Diamond or silicon carbide
C257S049000, C257S256000, C257S262000, C257S267000, C257S272000, C257S273000, C257SE27016, C257SE27017, C257SE27024, C257SE27068, C257SE27069, C257SE27073, C257SE29059, C257SE29194, C257SE29195
Reexamination Certificate
active
08049223
ABSTRACT:
A junction FET having a large gate noise margin is provided. The junction FET comprises an n−layer forming a drift region of the junction FET formed over a main surface of an n+substrate made of silicon carbide, a p+layer forming a gate region formed in contact with the n−layer forming the drift region and a gate electrode provided in an upper layer of the n+substrate. The junction FET further incorporates pn diodes formed over the main surface of the n+substrate and electrically connecting the p+layer forming the gate region and the gate electrode.
REFERENCES:
patent: 6107649 (2000-08-01), Zhao
patent: 2002/0113274 (2002-08-01), Iwagami et al.
patent: 2004/0135178 (2004-07-01), Onose et al.
patent: 2004-134547 (2003-04-01), None
S. Harada et al., “1.8 mΩcm2, 10 A Power MOSFET in 4H-SiC,” Proceedings of International Electron Device Meeting 2006.
Onose Hidekatsu
Shimizu Haruka
Miles & Stockbridge P.C.
Renesas Electronics Corporation
Sefer A.
Woldegeorgis Ermias
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