Semiconductor device with improved resurf features including...

Active solid-state devices (e.g. – transistors – solid-state diode – With means to increase breakdown voltage threshold – In integrated circuit

Reexamination Certificate

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Reexamination Certificate

active

10761235

ABSTRACT:
A p impurity region (3) defines a RESURF isolation region in an n−semiconductor layer (2). A trench isolation structure (8a) and the p impurity region (3) together define a trench isolation region in the n−semiconductor layer (2) in the RESURF isolation region. An nMOS transistor (103) is provided in the trench isolation region. A control circuit is provided in the RESURF isolation region excluding the trench isolation region. An n+buried impurity region (4) is provided at the interface between the n−semiconductor layer (2) and a p−semiconductor substrate (1), and under an n+impurity region7connected to a drain electrode (14) of the nMOS transistor (103).

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