Semiconductor device with elongated interconnecting member...

Semiconductor device manufacturing: process – Coating with electrically or thermally conductive material – To form ohmic contact to semiconductive material

Reexamination Certificate

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C438S637000, C438S672000

Reexamination Certificate

active

06919265

ABSTRACT:
In a semiconductor device with multiple wiring layers, to connect a conductive line in a lower wiring layer to a conductive line in an upper wiring layer, two conductive members are formed in the space between the upper and lower conductive layers, one conductive member in contact with each conductive line. The two conductive members meet in the space between the two conductive layers to form an electrical path between the two conductive lines. One or both of the conductive members may have a rectangular bar shape extending lengthwise along the conductive line with which it makes contact. The conductive members can have a reduced height and enlarged area that enables interconnections to be formed with greater stability and reliability than by conventional methods.

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