Semiconductor device with an insulating film separating conducti

Active solid-state devices (e.g. – transistors – solid-state diode – Field effect device – Having insulated electrode

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257323, 257641, H01L 29788

Patent

active

056524498

ABSTRACT:
A semiconductor device comprises a lower conductive layer formed on a semiconductor substrate, a first insulation film layer formed at least on side faces of the lower conductive layer, a second insulation film layer formed around the lower conductive layer on which the first insulation film layer has been formed, a contact hole formed on the second insulation film layer in the vicinity of a side face of the lower conductive layer, and an upper conductive layer formed in the contact hole and over the second insulation film. The first insulation film layer is of a three-film structure comprising a first oxide film, a nitride film and a second oxide film.

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S. Mori, et al; "1984 Symposium on VLSI Technology". Poly-Oxide / Nitride/Oxide Structure for Highly Reliable EPROM Cells Sep., 1984, pp. 40-41.

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