Semiconductor device producing method and substrate...

Details Semiconductor device producing method and substrate... Semiconductor device producing method and substrate...

2011-07-19

2011-07-19

Pham, Thanhha (Department: 2894)

Semiconductor device manufacturing: process

Coating of substrate containing semiconductor region or of...

Insulative material deposited upon semiconductive substrate

C438S216000, C438S261000, C257SE21278

Reexamination Certificate

active

07981815

ABSTRACT:
Disclosed is a producing method or a semiconductor device including: loading at least one substrate into a processing chamber; forming a metal oxide film or a silicon oxide film on a surface of the substrate by repeatedly supplying a metal compound or a silicon compound, each of which is a first material, an oxide material which is a second material including an oxygen atom, and a hydride material which is a third material, into the processing chamber predetermined times; and unloading the substrate from the processing chamber.

REFERENCES:
patent: 2002/0098627 (2002-07-01), Pomarede et al.
patent: 2003/0168001 (2003-09-01), Sneh
patent: 2004/0092132 (2004-05-01), Doan et al.
patent: 2006/0211223 (2006-09-01), Brcka
patent: 2007/0259110 (2007-11-01), Mahajani et al.
patent: 2004-523885 (2004-08-01), None
patent: 2006-161061 (2006-06-01), None
patent: 2003-0051873 (2003-06-01), None
Alam et al., Journal of Applied Physics, vol. 94, No. 5, Sep. 1, 2003, pp. 3403-3413.
Puurunen, Journal of Applied Physics, vol. 95, No. 9, May 1, 2004, pp. 4777-4786.
Korean Office Action issued on Jun. 25, 2010 in corresponding Korean Patent Application No. 10-2008-7018387.
Korean Office Action issued on Nov. 12, 2010 in corresponding Korean Patent Application No. 10-2008-7018387.

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