Semiconductor device manufacturing method, mask...

Radiation imagery chemistry: process – composition – or product th – Imaging affecting physical property of radiation sensitive... – Making electrical device

Reexamination Certificate

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C430S005000, C430S394000

Reexamination Certificate

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07820364

ABSTRACT:
In order to form a transfer pattern of desired size with high accuracy, a method for manufacturing a semiconductor device includes a process of forming the transfer pattern including a line whose width and angle varies, by performing multiple exposure using a plurality of masks having different patterns over different mask substrates.

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patent: 2005/0142457 (2005-06-01), Lee
patent: WO 01/63653 (2001-08-01), None

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