Semiconductor device manufacturing apparatus

Adhesive bonding and miscellaneous chemical manufacture – Differential fluid etching apparatus – With microwave gas energizing means

Patent

Rate now

  [ 0.00 ] – not rated yet Voters 0   Comments 0

Details

156643, 156646, 20429801, B44C 122, H01L 21306, C03C 1500, C03C 2506

Patent

active

050788248

ABSTRACT:
A semiconductor double-chamber etching apparatus which can be manually operated in a maintenance area by connecting a movable manual operation panel, with a communication device, to any one of a plurality of relay stations provided on the etching apparatus facing maintenance area. In this case, the manual operation panel of the etching apparatus provided on a face of the etching apparatus facing a clean room is not used. The clean room is adjacent to the maintenance area, and is separated from the maintenance room by a partition wall.

REFERENCES:
patent: 4252595 (1981-02-01), Yamamoto et al.
patent: 4666734 (1987-05-01), Kamiya et al.
patent: 4927484 (1990-05-01), Mitomi

LandOfFree

Say what you really think

Search LandOfFree.com for the USA inventors and patents. Rate them and share your experience with other people.

Rating

Semiconductor device manufacturing apparatus does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Semiconductor device manufacturing apparatus, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Semiconductor device manufacturing apparatus will most certainly appreciate the feedback.

Rate now

     

Profile ID: LFUS-PAI-O-819563

  Search
All data on this website is collected from public sources. Our data reflects the most accurate information available at the time of publication.