Semiconductor device manufacture using photoresist protective co

Details Semiconductor device manufacture using photoresist protective co Semiconductor device manufacture using photoresist protective co

1975-12-19

1980-04-29

Bowers, Jr., Charles L.

Radiation imagery chemistry: process, composition, or product th

Imaging affecting physical property of radiation sensitive...

Making electrical device

430327, 430524, 430531, G03C 500

Patent

active

042004632

ABSTRACT:
A protective coating composition for photoresist layers comprising an aqueous solution of a vinyl alcohol polymer, at least one surfactant having wetting properties and at least one surfactant having lubricant properties is disclosed. An improved process for forming a photoresist pattern employing this protective coating composition is also disclosed. The composition and process are particularly useful in the fabrication of semiconductor devices.

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patent: 3843368 (1974-10-01), Yamamoto et al.
patent: 3906133 (1975-09-01), Flutie

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