Radiation imagery chemistry: process – composition – or product th – Imaging affecting physical property of radiation sensitive... – Making electrical device
Patent
1975-12-19
1980-04-29
Bowers, Jr., Charles L.
Radiation imagery chemistry: process, composition, or product th
Imaging affecting physical property of radiation sensitive...
Making electrical device
430327, 430524, 430531, G03C 500
Patent
active
042004632
ABSTRACT:
A protective coating composition for photoresist layers comprising an aqueous solution of a vinyl alcohol polymer, at least one surfactant having wetting properties and at least one surfactant having lubricant properties is disclosed. An improved process for forming a photoresist pattern employing this protective coating composition is also disclosed. The composition and process are particularly useful in the fabrication of semiconductor devices.
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Bowers Jr. Charles L.
Clark Lowell E.
Motorola Inc.
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