Semiconductor device including storage node and method of...

Active solid-state devices (e.g. – transistors – solid-state diode – Field effect device – Having insulated electrode

Reexamination Certificate

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C257S309000

Reexamination Certificate

active

10830895

ABSTRACT:
A semiconductor device including storage nodes and a method of manufacturing the same: The method includes forming an insulating layer and an etch stop layer on a semiconductor substrate; forming storage node contact bodies to be electrically connected to the semiconductor substrate by penetrating the insulating layer and the etch stop layer; forming landing pads on the etch stop layer to be electrically connected to the storage node contact bodies, respectively; and forming storage nodes on the landing pads, respectively, the storage nodes of which outward sidewalls are completely exposed and which are arranged at an angle to each other.

REFERENCES:
patent: 6381165 (2002-04-01), Lee et al.
patent: 6396096 (2002-05-01), Park et al.
patent: 2001/0029113 (2001-10-01), Kunitomo et al.
patent: 2002/0084480 (2002-07-01), Basceri et al.
patent: 2004/0108536 (2004-06-01), Lee et al.
patent: 2336716 (1999-10-01), None
patent: 1999-0081113 (1999-11-01), None
English language abstract of Korean Publication No. 1999-0081113.

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