Semiconductor device including MOS capacitance

Active solid-state devices (e.g. – transistors – solid-state diode – Field effect device – Having insulated electrode

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Details

257532, 257369, H01L 27108, H01L 2976, H01L 2994, H01L 31119

Patent

active

057738602

ABSTRACT:
An improved semiconductor device including an MOS capacitance is provided, having enhanced MOS capacitance accuracy. A well of a first conductivity type is formed at the main surface of a semiconductor substrate. The above-described well is removed immediately under a capacitance dope layer.

REFERENCES:
patent: 5416354 (1995-05-01), Blackstone
patent: 5548150 (1996-08-01), Omura et al.
patent: 5576570 (1996-11-01), Ohsawa et al.

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