Semiconductor device including a SRAM section and a logic...

Active solid-state devices (e.g. – transistors – solid-state diode – Field effect device – Having insulated electrode

Reexamination Certificate

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C257S903000, C257SE27098

Reexamination Certificate

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07598574

ABSTRACT:
A semiconductor device including a SRAM section and a logic circuit section includes: a first n-type MIS transistor including a first n-type gate electrode formed with a first gate insulating film interposed on a first element formation region of a semiconductor substrate in the SRAM section; and a second n-type MIS transistor including a second n-type gate electrode formed with a second gate insulating film interposed on a second element formation region of the semiconductor substrate in the logic circuit section. A first impurity concentration of a first n-type impurity in the first n-type gate electrode is lower than a second impurity concentration of a second n-type impurity in the second n-type gate electrode.

REFERENCES:
patent: 5122474 (1992-06-01), Harrington, III
patent: 6010929 (2000-01-01), Chapman
patent: 6936844 (2005-08-01), Yamazaki et al.
patent: 7129543 (2006-10-01), Maeda et al.
patent: 7414292 (2008-08-01), Ema et al.
patent: 2004/0183141 (2004-09-01), Nakaoka et al.
patent: 2004/0256653 (2004-12-01), Iwata et al.
patent: 2006/0138568 (2006-06-01), Taniguchi et al.
patent: 2007/0221960 (2007-09-01), Ashida

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