Semiconductor device including a plurality of diffusion...

Active solid-state devices (e.g. – transistors – solid-state diode – Field effect device – Having insulated electrode

Reexamination Certificate

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C257S356000, C257S582000, C257S538000, C257S577000, C257S579000, C257S173000, C257SE29166, C257SE23114, C257SE23115

Reexamination Certificate

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08008723

ABSTRACT:
Aimed at reducing the area of a protective circuit in a semiconductor device provided therewith, a semiconductor device of the present invention has a first-conductivity-type well, a plurality of first diffusion layers formed in the well, a plurality of second diffusion layers formed in the well, and a diffusion resistance layer formed in the well, wherein the first diffusion layers have a second conductivity type, and are connected in parallel with each other to an input/output terminal of the semiconductor device; the second diffusion layers are arranged alternately with a plurality of first diffusion layers, and are connected to a power source or to the ground; the diffusion resistance layer has a second conductivity type, and is located in adjacent to any of the plurality of second diffusion layers; the diffusion resistance layer is connected to the input/output terminal of the semiconductor device, while being arranged in parallel with the first diffusion layers, and connects the internal circuit and the input/output terminal of the semiconductor device.

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