Semiconductor device including a MISFET and a MIS capacitor

Active solid-state devices (e.g. – transistors – solid-state diode – Field effect device – Having insulated electrode

Reexamination Certificate

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C257S601000, C257SE29344

Reexamination Certificate

active

10896899

ABSTRACT:
A semiconductor device comprises varactor regions Va and transistor regions Tr. An active region for a varactor is formed with a substrate contact impurity diffusion region obtained by doping an N well region with N-type impurity at a relatively high concentration. However, any extension region (or LDD region) as in a varactor of a known semiconductor device is not formed in the active region for a varactor. On the other hand, parts of a P well region located to both sides of the polysilicon gate electrode in the transistor region Tr are formed with high-concentration source/drain regions and extension regions. Therefore, the extendable range of a depletion layer is kept wide to extend the capacitance variable range of the varactor.

REFERENCES:
patent: 6034388 (2000-03-01), Brown et al.
patent: 6194279 (2001-02-01), Chen et al.
patent: 6653716 (2003-11-01), Vashchenko et al.
patent: 6703297 (2004-03-01), Hellig
patent: 6858918 (2005-02-01), Maeda et al.
patent: 2003/0052389 (2003-03-01), Maeda et al.
patent: 9-121025 (1997-05-01), None

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