Semiconductor device having super junction structure

Active solid-state devices (e.g. – transistors – solid-state diode – Field effect device – Having insulated electrode

Reexamination Certificate

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C257S342000, C257SE29027, C257SE29257

Reexamination Certificate

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07633123

ABSTRACT:
A semiconductor device includes: two main electrodes; multiple first regions; and multiple second regions. The first region having a first impurity concentration and a first width and the second region having a second impurity concentration and a second width are alternately repeated. A product of the first impurity concentration and the first width is equal to a product of the second impurity concentration and the second width. The first width is equal to or smaller than 4.5 μm. The first impurity concentration is lower than a predetermined concentration satisfying a RESURF condition. A ratio between on-state resistances of the device at 27° C. and at 150° C. is smaller than 1.8.

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patent: A-2000-260984 (2005-11-01), None
C. Rochefort and R. van Dalen, “A scalable trench etch based process for high voltage vertical Resurf MOSFETs,”Proceedings of the 17thInternational Symposium on Power Semiconductor Devices&IC's, May 23-26, 2005, pp. 35-38 (Discussed on p. 2 of the specification).

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