Active solid-state devices (e.g. – transistors – solid-state diode – Field effect device – Having insulated electrode
Reexamination Certificate
2006-12-27
2009-12-15
Dang, Trung (Department: 2892)
Active solid-state devices (e.g., transistors, solid-state diode
Field effect device
Having insulated electrode
C257S342000, C257SE29027, C257SE29257
Reexamination Certificate
active
07633123
ABSTRACT:
A semiconductor device includes: two main electrodes; multiple first regions; and multiple second regions. The first region having a first impurity concentration and a first width and the second region having a second impurity concentration and a second width are alternately repeated. A product of the first impurity concentration and the first width is equal to a product of the second impurity concentration and the second width. The first width is equal to or smaller than 4.5 μm. The first impurity concentration is lower than a predetermined concentration satisfying a RESURF condition. A ratio between on-state resistances of the device at 27° C. and at 150° C. is smaller than 1.8.
REFERENCES:
patent: 6040600 (2000-03-01), Uenishi et al.
patent: 6103578 (2000-08-01), Uenishi et al.
patent: 6512268 (2003-01-01), Ueno
patent: 6844592 (2005-01-01), Yamaguchi et al.
patent: 6949798 (2005-09-01), Nitta et al.
patent: 7112519 (2006-09-01), Yamaguchi et al.
patent: 7115475 (2006-10-01), Yamaguchi et al.
patent: 7498635 (2009-03-01), Kitagawa et al.
patent: 7541643 (2009-06-01), Ono et al.
patent: 7554155 (2009-06-01), Saito et al.
patent: 2004/0016959 (2004-01-01), Yamaguchi et al.
patent: A-2000-260984 (2005-11-01), None
C. Rochefort and R. van Dalen, “A scalable trench etch based process for high voltage vertical Resurf MOSFETs,”Proceedings of the 17thInternational Symposium on Power Semiconductor Devices&IC's, May 23-26, 2005, pp. 35-38 (Discussed on p. 2 of the specification).
Hattori Yoshiyuki
Okada Kyoko
Yamaguchi Hitoshi
Yamauchi Shoichi
Dang Trung
Denso Corporation
Posz Law Group , PLC
LandOfFree
Semiconductor device having super junction structure does not yet have a rating. At this time, there are no reviews or comments for this patent.
If you have personal experience with Semiconductor device having super junction structure, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Semiconductor device having super junction structure will most certainly appreciate the feedback.
Profile ID: LFUS-PAI-O-4142260