Active solid-state devices (e.g. – transistors – solid-state diode – Field effect device – Having insulated electrode
Patent
1997-12-29
2000-05-09
Ngo, Ngan V.
Active solid-state devices (e.g., transistors, solid-state diode
Field effect device
Having insulated electrode
257347, H01L 2701, H01L 2712, H01L 310392
Patent
active
060607505
ABSTRACT:
To suppress floating substrate in the thin SOI.MOSFET formed on the SOI substrate, the gate (electrode) has a two-layer structure and the upper gate thereof is in contact with the sides of the SOI layer (substrate).
REFERENCES:
patent: 3974515 (1976-08-01), Ipri et al.
patent: 4996574 (1991-02-01), Shirasaki
patent: 5115289 (1992-05-01), Hisamoto et al.
patent: 5381029 (1995-01-01), Eguchi et al.
F. Assaderaghi et al., "A Dynamic Threshold Voltage MOSFET (DTMOS) for Very Low Voltage Operation", IEEE Electron Device Letters, vol. 15, No. 12, Dec. 1994.
Hisamoto Dai
Sudou Yoshimi
Hitachi , Ltd.
Ngo Ngan V.
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