Active solid-state devices (e.g. – transistors – solid-state diode – Field effect device – Having insulated electrode
Patent
1993-02-19
1999-04-13
Prenty, Mark V.
Active solid-state devices (e.g., transistors, solid-state diode
Field effect device
Having insulated electrode
257349, H01L 2701
Patent
active
058941517
ABSTRACT:
An insulated gate semiconductor device comprising an insulator substrate having provided thereon a source and a drain region; a channel region being incorporated between said source and said drain regions, said channel region comprising a polycrystalline, a single crystal, or semi-amorphous semiconductor material; and a region provided under said channel region, said region comprising an amorphous material containing the same material as that of the channel region as the principal component, or said region comprising a material having a band gap larger than said channel region. A process for fabricating the device is also disclosed.
REFERENCES:
patent: 4775641 (1988-10-01), Duffy et al.
patent: 4816893 (1989-03-01), Mayer et al.
patent: 4916090 (1990-04-01), Motai et al.
patent: 4960719 (1990-10-01), Tanaka et al.
patent: 5111261 (1992-05-01), Tanaka et al.
patent: 5275872 (1994-01-01), Chang
patent: 5289030 (1994-02-01), Yamazaki et al.
patent: 5365080 (1994-11-01), Yamazaki et al.
patent: 5485019 (1996-01-01), Yamazaki et al.
patent: 5514879 (1996-05-01), Yamazaki
Takemura Yasuhiko
Yamazaki Shunpei
Zhang Hongyong
Fergguson, Jr. Gerald J.
Prenty Mark V.
Robinson Eric J.
Semiconductor Energy Laboratory Co,. Ltd.
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