Semiconductor device having MOS varactor and methods for...

Semiconductor device manufacturing: process – Voltage variable capacitance device manufacture

Reexamination Certificate

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C438S238000, C257SE21351, C257SE21378

Reexamination Certificate

active

07611956

ABSTRACT:
A semiconductor device with having a MOS varactor and methods of fabricating the same are disclosed. The MOS varactor includes a metal gate electrode, an active semiconductor plate interposed between the metal gate electrode and the semiconductor substrate, and a capacitor dielectric layer interposed between the metal gate electrode and the active semiconductor plate. Further, a lower insulating layer insulates the MOS varactor from the semiconductor substrate. According to the present invention, a metal gate electrode is used to reduce poly depletion, thereby increasing a tuning range of the varactor, and to manufacture a reliable metal resistor without the need of an additional photomask.

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patent: 1020010054440 (2001-07-01), None
patent: 1020010086499 (2001-09-01), None

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