Semiconductor device manufacturing: process – Voltage variable capacitance device manufacture
Reexamination Certificate
2007-11-16
2009-11-03
Lindsay, Jr., Walter L (Department: 2812)
Semiconductor device manufacturing: process
Voltage variable capacitance device manufacture
C438S238000, C257SE21351, C257SE21378
Reexamination Certificate
active
07611956
ABSTRACT:
A semiconductor device with having a MOS varactor and methods of fabricating the same are disclosed. The MOS varactor includes a metal gate electrode, an active semiconductor plate interposed between the metal gate electrode and the semiconductor substrate, and a capacitor dielectric layer interposed between the metal gate electrode and the active semiconductor plate. Further, a lower insulating layer insulates the MOS varactor from the semiconductor substrate. According to the present invention, a metal gate electrode is used to reduce poly depletion, thereby increasing a tuning range of the varactor, and to manufacture a reliable metal resistor without the need of an additional photomask.
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Kim Dae-Hyun
Oh Han-Su
Lindsay, Jr. Walter L
Samsung Electronics Co,. Ltd.
Volentine & Whitt PLLC
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