Semiconductor device having misfet gate electrodes with and...

Active solid-state devices (e.g. – transistors – solid-state diode – Field effect device – Having insulated electrode

Reexamination Certificate

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C257SE21425

Reexamination Certificate

active

11132373

ABSTRACT:
The performance and reliability of a semiconductor device are improved. In a semiconductor device having a CMISFET, a gate electrode of an n channel MISFET is composed of a nickel silicide film formed by reacting a silicon film doped with P, As, or Sb with an Ni film, and a gate electrode of a p channel MISFET is composed of a nickel-silicon-germanium film formed by reacting a nondope silicon germanium film with the Ni film. The work function of the gate electrode of the n channel MISFET is controlled by doping P, As, or Sb, and the work function of the gate electrode of the p channel MISFET is controlled by adjusting the Ge concentration.

REFERENCES:
patent: 6599831 (2003-07-01), Maszara et al.
patent: 2001/0023116 (2001-09-01), Wurzer et al.
patent: 2002/0130393 (2002-09-01), Takayanagi et al.
patent: 2003/0203609 (2003-10-01), Maszara et al.
patent: 2000-252462 (1999-03-01), None
patent: 2002-319670 (2001-04-01), None
patent: 2003-347425 (2003-04-01), None
patent: 2005-191545 (2004-11-01), None
Office Action from the Japanese Patent Office dated Apr. 18, 2006 (in Japanese).

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