Semiconductor device having inversion inducing gate

Active solid-state devices (e.g. – transistors – solid-state diode – Field effect device – Having insulated electrode

Patent

Rate now

  [ 0.00 ] – not rated yet Voters 0   Comments 0

Details

H01L 2976

Patent

active

058959491

ABSTRACT:
A semiconductor device is characterized by comprising a semiconductor substrate, a first insulating film formed on the semiconductor substrate, a plurality of cell transistors each having a control gate formed on the semiconductor substrate through the first insulating film, a second insulating film formed on upper and side surfaces of the control gate, and a conductive film formed on at least the side surface of the control gate through the second insulating film.

REFERENCES:
patent: 5278439 (1994-01-01), Ma et al.
patent: 5554867 (1996-09-01), Ajika et al.

LandOfFree

Say what you really think

Search LandOfFree.com for the USA inventors and patents. Rate them and share your experience with other people.

Rating

Semiconductor device having inversion inducing gate does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Semiconductor device having inversion inducing gate, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Semiconductor device having inversion inducing gate will most certainly appreciate the feedback.

Rate now

     

Profile ID: LFUS-PAI-O-2249586

  Search
All data on this website is collected from public sources. Our data reflects the most accurate information available at the time of publication.