Semiconductor device having improved pad coupled to wiring...

Active solid-state devices (e.g. – transistors – solid-state diode – Combined with electrical contact or lead – Configuration or pattern of bonds

Reexamination Certificate

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C257S784000, C257S700000, C257S701000, C257S758000, C257S778000, C257S774000, C257S680000, C257S698000, C257S737000, C257S738000

Reexamination Certificate

active

06353266

ABSTRACT:

BACKGROUND OF THE INVENTION
1. Field of the Invention
The present invention relates to a semiconductor device, and more particular to a flip-chip package.
2. Description of the Related Art
FIG. 4
is a sectional view of a flip-chip type semiconductor device for describing a first related art. Referring to
FIG. 4
, the device has a top layer wiring
46
on a semiconductor substrate
48
, a cover layer
44
having a through hole
45
for exposing the top layer wiring
46
, and a copper pad
42
to electrically connect with the wiring
46
via the through hole
45
. As an example of the first prior art, there may be mentioned a technology disclosed in Japanese Patent Application Laid Open Hei 9-270426.
FIG. 5
is a sectional view of a flip-chip type semiconductor device for describing a second related art. Referring to
FIG. 5
, the device has a top layer wiring
56
on a semiconductor substrate
58
, a cover film
54
having a through hole
55
formed on the top layer wiring
56
and the semiconductor substrate
58
, a copper pad
52
to electrically connect with the wiring
56
via the through hole
55
, a second cover film
51
formed on the pad
52
, and a second opening
53
formed in the portion of the second cover film
51
above the top layer wiring
52
.
However, since the wirings
45
,
55
of the device according to the first and second prior arts are formed on the films
44
,
54
, respectively, a large area for the wiring is needed on the cover film. Therefore, it becomes difficult to form wirings without connecting from each other when the device is made smaller.
FIG. 4
also has a problem in that it necessitates the process of forming the through hole
45
. Moreover, the films
44
(
45
) has the through hole
45
(
55
) by a carved wall to position a solder ball (not shown) on a center of the wiring
44
. However, it is difficult to form such a carved wall. Additionally, since the wiring
45
is made with a thin thickness enough to keep the carve of the carved wall and is patterned as shown in
FIGS. 4 and 5
, it needs complex technique to keep such demands.
SUMMARY OF THE INVENTION
It is an object of the present invention to provide a semiconductor device with high reliability and high yield that avoids the misalignment between the pad and a solder ball and reduces the area for the pad.
A semiconductor device of the present invention includes a semiconductor substrate, a wiring formed on the semiconductor substrate, a cover film formed on the semiconductor substrate and the wiring, the cover film has a through hole to expose the wiring, and a pad formed in the through hole to electrically connect to the wiring without being formed on a top surface of the cover film.
A method of manufacturing a semiconductor of the present invention includes:
forming a first insulating film on a first wiring, the first insulating film having a through hole to expose the first wiring;
forming a conductive layer on the film; and
etching the conductive layer until a top surface of the film is exposed to form a pad in the through hole.
Preferably, the conductive layer is etched by a chemical mechanical polishing process.


REFERENCES:
patent: 5903058 (1999-05-01), Akam
patent: 5911109 (1999-06-01), Razouk et al.
patent: 5965943 (1999-10-01), Mizuta
patent: 6042953 (2000-03-01), Yamaguchi et al.
patent: 6051489 (2000-04-01), Young et al.
patent: 6072242 (2000-06-01), Son
patent: 6084304 (2000-07-01), Huang et al.
patent: 6157078 (2000-12-01), Lansford
patent: 6157079 (2000-12-01), Taguchi
patent: 6188134 (2001-02-01), Stumburg et al.
patent: 6198170 (2001-02-01), Zhao
patent: 9-270426 (1997-10-01), None

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