Active solid-state devices (e.g. – transistors – solid-state diode – Field effect device – Having insulated electrode
Reexamination Certificate
2007-09-04
2007-09-04
Trinh, Michael (Department: 2822)
Active solid-state devices (e.g., transistors, solid-state diode
Field effect device
Having insulated electrode
C257S410000, C257S411000, C257SE21001
Reexamination Certificate
active
11148317
ABSTRACT:
A semiconductor device manufacture method has the steps of: (a) forming an interface layer of SiO or SiON on the surface of an active region of a silicon substrate; (b) forming a high dielectric constant gate insulating film such as HfSiON having a dielectric constant higher than that of silicon oxide, above the interface layer; (c) forming a gate electrode of polysilicon above the high dielectric constant gate insulating film; (d) passivating the substrate surface at least before or after the high dielectric constant gate insulating film is formed; (e) forming an insulated gate electrode structure by patterning at least the gate electrode and the high dielectric constant gate insulating film; and (f) forming source/drain regions in the active region on both sides of the insulated gate electrode structure. The semiconductor device has the high dielectric constant insulating film having a dielectric constant higher than that of silicon oxide.
REFERENCES:
patent: 6784114 (2004-08-01), Tao et al.
patent: 6809370 (2004-10-01), Colombo et al.
patent: 2006/0094259 (2006-05-01), Gilmer et al.
patent: 11-163276 (1999-06-01), None
patent: 2001-77111 (2001-03-01), None
patent: 2001-274378 (2001-10-01), None
patent: 2002-359370 (2002-12-01), None
patent: 2003-8011 (2003-01-01), None
patent: 2003-23005 (2003-01-01), None
Ikeda Kazuto
Minakata Hiroshi
Sakoda Tsunehisa
Yamaguchi Masaomi
Trinh Michael
Westerman, Hattori, Daniels & Adrian , LLP.
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