Semiconductor device having contact hole with improved...

Active solid-state devices (e.g. – transistors – solid-state diode – Field effect device – Having insulated electrode

Reexamination Certificate

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C257S750000, C257S758000

Reexamination Certificate

active

06987296

ABSTRACT:
A semiconductor device includes a semiconductor substrate, a lower conductive layer formed over the semiconductor substrate, an intermediate insulating layer formed over the lower conductive layer and an upper conductive layer formed over the intermediate insulating layer. The upper conductive layer crosses the lower conductive layer. The semiconductor device also includes a contact hole formed at a crossing portion of the lower conductive layer and the upper conductive layer. The contact hole is formed in the intermediate insulating layer. An aspect ratio of the contact hole is greater than 0.6.

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patent: 5410183 (1995-04-01), Murai
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patent: 5804479 (1998-09-01), Aoki et al.
patent: 6121684 (2000-09-01), Liaw
patent: 6225698 (2001-05-01), Tang
patent: 02-187031 (1990-07-01), None
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patent: 8-23033 (1996-01-01), None
patent: 9-107082 (1997-01-01), None
patent: 11-274434 (1999-10-01), None

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