Semiconductor device having a vertical insulated gate field effe

Active solid-state devices (e.g. – transistors – solid-state diode – Field effect device – Having insulated electrode

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Details

257339, 257341, 257342, H01L 2976, H01L 2994, H01L 31062, H01L 31113

Patent

active

056568436

ABSTRACT:
A semiconductor device (1) includes a vertical insulated gate field effect device (2) and has a semiconductor body (3) with a first semiconductor region (4) of one conductivity type adjacent one major surface (5). A second semiconductor region (6) of the opposite conductivity type is former within the first region (4) adjacent the surface (5) and a third region (7) forms with the second region (6) a rectifying junction (8) meeting the one major surface (5). A recess (9) extends into the first region (4) from the one major surface (5) so that the second and third regions (6 and 7) abut the recess (9), and an insulated gate (10) is formed within the recess (9) for controlling conduction between the first and third regions (4 and 7) along a conduction channel area (61) of the second region (6). A fourth region (11) of the one conductivity type forms with a portion (6b) of the second region (6) of the opposite conductivity type remote from the recess (9) a further rectifying junction (12) which is reverse-biassed in at least one mode of operation of the device and has a predetermined breakdown voltage for causing the device to breakdown in the vicinity of the further rectifying junction (12) away from the recess (9) when a critical voltage is exceeded.

REFERENCES:
patent: 4573066 (1986-02-01), Whight
patent: 4707719 (1987-11-01), Whight
patent: 4774560 (1988-09-01), Coe
patent: 4931846 (1990-06-01), Mihara
patent: 4983535 (1991-01-01), Blanchard
patent: 5072266 (1991-12-01), Bulucea et al.

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