Semiconductor device having a non-straight line pattern with...

Details Semiconductor device having a non-straight line pattern with... Semiconductor device having a non-straight line pattern with...

2005-12-13

2005-12-13

Nguyen, Cuong (Department: 2811)

Active solid-state devices (e.g., transistors, solid-state diode

Field effect device

Having insulated electrode

C257S309000

Reexamination Certificate

active

06974992

ABSTRACT:
A method of forming a device pattern of a semiconductor device. The method includes the steps of carrying out an over-exposure to a resist film using a mask which has transmission regions which are positioned about a circumference of each of intended patterns of a resist film. Then carrying out a development of the resist film to form a resist pattern having the intended patterns. And then forming a device pattern of a semiconductor device by use of the resist pattern.

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patent: 61-270823 (1986-12-01), None
patent: 7-134395 (1995-05-01), None

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