Active solid-state devices (e.g. – transistors – solid-state diode – Field effect device – Junction field effect transistor
Reexamination Certificate
2007-03-06
2007-03-06
Hoang, Quoc (Department: 2818)
Active solid-state devices (e.g., transistors, solid-state diode
Field effect device
Junction field effect transistor
C257S341000, C257SE21418, C257S401000, C257SE29257, C438S186000
Reexamination Certificate
active
11285300
ABSTRACT:
In a semiconductor device having a multi-bridge-channel, and a method for fabricating the same, the device includes first and second semiconductor posts protruding from a surface of a semiconductor substrate and having a source and a drain region, respectively, in upper side portions thereof, channel semiconductor layers connecting upper side portions of the first and second semiconductor posts, a gate insulation layer on the channel semiconductor layers and the semiconductor substrate, the gate insulation layer surrounding at least a portion of the channel semiconductor layers, a gate electrode layer on the gate insulation layer to enclose at least a portion of a region between the channel semiconductor layers, and junction auxiliary layers formed between the channel semiconductor layers, the junction auxiliary layers contacting the gate electrode layer and upper side portions of the first and second semiconductor posts, and having a same width as the channel semiconductor layers.
REFERENCES:
patent: 6207511 (2001-03-01), Chapman et al.
patent: 6562665 (2003-05-01), Yu
patent: 6800910 (2004-10-01), Lin et al.
patent: 10-2004-0075566 (2004-08-01), None
Kim Sung-min
Lee Sung-young
Yun Eun-jung
Hoang Quoc
Lee & Morse P.C.
Samsung Electronics Co,. Ltd.
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