Semiconductor device having a ferroelectric capacitor and a...

Semiconductor device manufacturing: process – Having magnetic or ferroelectric component

Reexamination Certificate

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C438S240000, C438S253000, C438S381000

Reexamination Certificate

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06964873

ABSTRACT:
A method of fabricating a semiconductor device having a ferroelectric capacitor includes the steps of forming a lower electrode layer of the ferroelectric capacitor on an insulation film covering an active device element, forming a ferroelectric film on the lower electrode layer as a capacitor insulation film, crystallizing the ferroelectric film by applying a thermal annealing process in an atmosphere containing a non-oxidizing gas and an oxidizing gas, and forming an upper electrode layer on the ferroelectric film.

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European Patent Office Search Report for EPO Application No. 00122735.4-2203 to Fujitsu Limited, Feb. 28, 2001.

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