Semiconductor device manufacturing: process – Packaging or treatment of packaged semiconductor
Reexamination Certificate
2011-07-26
2011-07-26
Menz, Douglas M (Department: 2891)
Semiconductor device manufacturing: process
Packaging or treatment of packaged semiconductor
C438S113000, C438S127000
Reexamination Certificate
active
07985618
ABSTRACT:
A semiconductor device and a fabrication method thereof are provided. An opening having at least one slanted side is formed on a substrate. At least one chip and at least one passive component are mounted on the substrate. An encapsulant having a cutaway corner is formed on the substrate to encapsulate the chip and the passive component, wherein the cutaway corner of the encapsulant is spaced apart from the slanted side of the opening by a predetermined distance. A singulation process is performed to cut the encapsulant to form a package with a chamfer. The package is embedded in a lid to form the semiconductor device, wherein a portion of the substrate located between the slanted side of the opening and the cutaway corner of the encapsulant is exposed from the encapsulant to form an exposed portion. The present invention also provides a carrier for the semiconductor device.
REFERENCES:
patent: 6040622 (2000-03-01), Wallace
patent: 6770961 (2004-08-01), Lee
patent: 2003/0034552 (2003-02-01), Wada et al.
patent: 2003/0137042 (2003-07-01), Mess et al.
patent: 2004/0169265 (2004-09-01), Bolken
patent: 2004/0259291 (2004-12-01), Takiar
Chen Chien-Chih
Huang Chien-Ping
Tsai Yu-Chieh
Tsai Yun-Lung
Menz Douglas M
Siliconware Precision Industries Co. Ltd.
LandOfFree
Semiconductor device has encapsulant with chamfer such that... does not yet have a rating. At this time, there are no reviews or comments for this patent.
If you have personal experience with Semiconductor device has encapsulant with chamfer such that..., we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Semiconductor device has encapsulant with chamfer such that... will most certainly appreciate the feedback.
Profile ID: LFUS-PAI-O-2702858