Semiconductor device formed in semiconductor layer arranged...

Active solid-state devices (e.g. – transistors – solid-state diode – Field effect device – Having insulated electrode

Reexamination Certificate

Rate now

  [ 0.00 ] – not rated yet Voters 0   Comments 0

Details

C257S401000, C257SE27112

Reexamination Certificate

active

07420249

ABSTRACT:
A semiconductor device including a first semiconductor layer formed on a semiconductor substrate, a second semiconductor layer surrounding the first semiconductor layer, the second semiconductor layer being formed on the semiconductor substrate with one of an insulating film and a cavity, and a third semiconductor layer surrounding the second semiconductor layer, the third semiconductor layer being formed on the semiconductor substrate.

REFERENCES:
patent: 4879585 (1989-11-01), Usami
patent: 5159416 (1992-10-01), Kudoh
patent: 5489547 (1996-02-01), Erdeljac et al.
patent: 5565697 (1996-10-01), Asakawa et al.
patent: 5589695 (1996-12-01), Malhi
patent: 5686755 (1997-11-01), Malhi
patent: 5894152 (1999-04-01), Jaso et al.
patent: 6034399 (2000-03-01), Brady et al.
patent: 6127701 (2000-10-01), Disney
patent: 6140163 (2000-10-01), Gardner et al.
patent: 6191451 (2001-02-01), Nowak et al.
patent: 6214694 (2001-04-01), Leobandung et al.
patent: 6229179 (2001-05-01), Song et al.
patent: 6288427 (2001-09-01), Huang
patent: 6380037 (2002-04-01), Osanai
patent: 6784490 (2004-08-01), Inoue et al.
patent: 7002211 (2006-02-01), Onishi et al.
patent: 7042046 (2006-05-01), Onishi et al.
patent: 2001/0004124 (2001-06-01), Noda et al.
patent: 6-302791 (1994-10-01), None
patent: 11-17001 (1999-01-01), None
patent: 1999-0068200 (1999-08-01), None
patent: 2000-0035489 (2000-06-01), None
Robert Hannon, et al., “0.25mm Merged Bulk DRAM and SOI Logic using Patterned SOI”, 2000 Symposium on VLSI, Technology Digest of Technical Papers, (2 pages).
H.L. Ho, et al., “A 0.13 μm High-Performance SOI Logic Technology with Embedded DRAM for System-On-A-Chip Application”, 2001 IEDM Technical Digest, (4 pages).

LandOfFree

Say what you really think

Search LandOfFree.com for the USA inventors and patents. Rate them and share your experience with other people.

Rating

Semiconductor device formed in semiconductor layer arranged... does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Semiconductor device formed in semiconductor layer arranged..., we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Semiconductor device formed in semiconductor layer arranged... will most certainly appreciate the feedback.

Rate now

     

Profile ID: LFUS-PAI-O-3973250

  Search
All data on this website is collected from public sources. Our data reflects the most accurate information available at the time of publication.