Semiconductor device for protecting an internal circuit from ele

Active solid-state devices (e.g. – transistors – solid-state diode – Field effect device – Having insulated electrode

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257355, 257356, 257362, 257363, 361 90, 361 91, 361 56, 327419, 327427, 327434, 327437, H01L 2362, H02H 900, H02H 320, H03K 1760

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055148930

ABSTRACT:
A semiconductor device includes an input/output terminal, an internal circuit connected to the input/output terminal, a first terminal for providing a first electrical potential, and a second terminal for providing a second electrical potential which is lower than the first electrical potential, the device further including: a first n-channel MOS transistor having a drain connected to the input/output terminal, a source connected to the second terminal, and a gate to be electrically connected to the first terminal; and a first switching element for switching between an electrically conductive state and a non-conductive state between the drain and the gate of the first n-channel MOS transistor, the switching element forming the electrically conductive state between the drain and the gate of the first n-channel MOS transistor when 1) a surge voltage lower than the first electrical potential is applied to the input/output terminal, and 2) an electrical potential difference between the drain and the gate of the first n-channel MOS transistor exceeds a predetermined voltage lower than a breakdown voltage of the gate of the first n-channel MOS transistor. The formation of the electrically conductive state prevents the gate oxide of the first n-channel MOS transistor from being damaged.

REFERENCES:
patent: 4994874 (1991-02-01), Shimizu et al.
patent: 5021853 (1991-06-01), Mistry
patent: 5075577 (1991-12-01), Okitaka
patent: 5173755 (1992-12-01), Co et al.
patent: 5181092 (1993-01-01), Atsumi
patent: 5182220 (1993-01-01), Ker et al.
Electrical Overstress/Electrostatic Discharge Symposium Proceedings, 1984, "A CMOS VLSI ESD Input protection Device, DIFIDW", by Lin et al., pp. 202-209.

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