Active solid-state devices (e.g. – transistors – solid-state diode – Field effect device – Having insulated electrode
Reexamination Certificate
2008-01-29
2008-01-29
Quach, T. N. (Department: 2826)
Active solid-state devices (e.g., transistors, solid-state diode
Field effect device
Having insulated electrode
C257S532000, C257S536000, C257SE27016
Reexamination Certificate
active
07323749
ABSTRACT:
A semiconductor device with a plurality of passive components (7,7a,8,8a) comprising a bottom substrate (1), a buried oxide layer (2) on a portion of the top surface of the bottom substrate (1), an dielectric intermediate insulating layer (3) on a portion of the buried oxide layer (2), a dielectric top insulating layer (4), and at least one implanted passive component (7a,8a) of a semiconductor material implanted under the buried oxide layer (2) within the top surface portion of the bottom substrate (1), the implanted semiconductor material having a material polarity being opposite to the bottom substrate polarity. When the implanted passive component (7a) is an AC decoupling capacitor (7a), the bottom and side portions of the implanted semiconductor material are surrounded by a depletion layer (7b) of a semiconductor material implanted between said bottom substrate (1) and said implanted semiconductor material.
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Harness & Dickey & Pierce P.L.C.
Quach T. N.
Seiko Epson Corporation
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