Active solid-state devices (e.g. – transistors – solid-state diode – Field effect device – Having insulated electrode
Reexamination Certificate
2011-02-08
2011-02-08
Smith, Bradley K (Department: 2894)
Active solid-state devices (e.g., transistors, solid-state diode
Field effect device
Having insulated electrode
C257S328000, C257S330000, C257SE29001, C257SE27091, C257SE27095, C257SE27155
Reexamination Certificate
active
07884418
ABSTRACT:
A semiconductor device includes active areas which are insulatedly separated from each other by element-separation insulating films; a gate insulating film formed on each active area; a gate electrode which extends across the active area via the gate insulating film; a source area and a drain area formed in the active area so as to interpose the gate electrode; and a fin-channel structure in which at the intersection between the active area and the gate electrode, trenches are provided at both sides of the active area, and part of the gate electrode is embedded in each trench via the gate insulating film, so that the gate electrode extends across a fin which rises between the trenches. In the gate insulating film, the film thickness of a part which contacts the bottom surface of each trench is larger than that of a part which contacts the upper surface of the fin.
REFERENCES:
patent: 6444528 (2002-09-01), Murphy
patent: 7553748 (2009-06-01), Jang et al.
patent: 05-343681 (1993-12-01), None
patent: 11-068069 (1999-03-01), None
patent: 2002-151688 (2002-05-01), None
Elpida Memory Inc.
Karimy Mohammad T
Smith Bradley K
Sughrue & Mion, PLLC
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