Semiconductor device and method of manufacturing the same

Details Semiconductor device and method of manufacturing the same Semiconductor device and method of manufacturing the same

2006-02-21

2006-02-21

Wille, Douglas (Department: 2814)

Semiconductor device manufacturing: process

Formation of semiconductive active region on any substrate

On insulating substrate or layer

C438S486000, C438S487000

Reexamination Certificate

active

07001829

ABSTRACT:
In a method of manufacturing a semiconductor device, a laser beam capable of irradiating a large area in one shot is irradiated to an amorphous silicon film into which a catalytic element is intentionally introduced to crystallize the amorphous silicon film, thus obtaining a crystalline silicon film.

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