Semiconductor device and method of manufacture thereof

Details Semiconductor device and method of manufacture thereof Semiconductor device and method of manufacture thereof

2011-07-26

2011-07-26

Such, Matthew W (Department: 2891)

Active solid-state devices (e.g., transistors, solid-state diode

Field effect device

Having insulated electrode

C257S341000, C257SE29256, C257SE21417, C438S298000

Reexamination Certificate

active

07986004

ABSTRACT:
In a high withstand voltage transistor of a LOCOS offset drain type having a buried layer, a plurality of stripe-shaped diffusion layers are formed below a diffusion layer ranging from an offset layer to a drain layer and a portion between the drain region and the buried layer is depleted completely; thus, a withstand voltage between the drain region and the buried layer is improved. By the formation of the stripe-shaped diffusion layers, the drain region becomes widened; thus, on-resistance is reduced. Further, the buried layer is made high in concentration so as to sufficiently suppress an operation of a parasitic bipolar transistor.

REFERENCES:
patent: 5548150 (1996-08-01), Omura et al.
patent: 6034416 (2000-03-01), Uehara et al.
patent: 6168983 (2001-01-01), Rumennik et al.
patent: 6424007 (2002-07-01), Disney
patent: 6803629 (2004-10-01), Tihanyi
patent: 2001/0000288 (2001-04-01), Oh
patent: 2004/0113210 (2004-06-01), Chau et al.
patent: 2005/0045922 (2005-03-01), Ahlers et al.
patent: 2008/0093641 (2008-04-01), Ludikhuize et al.
patent: 60-20560 (1985-02-01), None

Affiliated with

Also associated with

Rating

Semiconductor device and method of manufacture thereof does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Semiconductor device and method of manufacture thereof, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Semiconductor device and method of manufacture thereof will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFUS-PAI-O-2649604