Semiconductor device and method of fabricating semiconductor...

Details Semiconductor device and method of fabricating semiconductor... Semiconductor device and method of fabricating semiconductor...

2011-05-24

2011-05-24

Smith, Matthew S (Department: 2823)

Active solid-state devices (e.g., transistors, solid-state diode

Field effect device

Having insulated electrode

C257S330000, C257SE29257, C257SE21419, C438S270000

Reexamination Certificate

active

07948031

ABSTRACT:
A semiconductor device includes a gate electrode formed through an insulating film in a groove having a first side surface adjacent to a source region and a base region, and a second conductive type first impurity region formed adjacent to a second side surface of the groove between the groove and a lead-out portion of a drain region existing below the base region so as to extend downward beyond a lower end of the groove.

REFERENCES:
patent: 5525821 (1996-06-01), Harada et al.
patent: 5682048 (1997-10-01), Shinohara et al.
patent: 6323518 (2001-11-01), Sakamoto et al.
patent: 6828626 (2004-12-01), Oikawa et al.
patent: 6967139 (2005-11-01), Oikawa et al.
patent: 6-45612 (1994-02-01), None
patent: 8-316467 (1996-11-01), None
patent: 2000-91344 (2000-03-01), None
patent: 2000-188397 (2000-07-01), None
patent: 2000-188397 (2000-07-01), None
patent: 2000-332243 (2000-11-01), None
patent: 2003-174166 (2003-06-01), None
patent: 2003-303960 (2003-10-01), None
Chinese Office Action for corresponding CN Application No. 200810129578.1, dated Dec. 11, 2009, pp. 1-7.
Japanese Office Action for corresponding Patent Application No. JP 2007-175548, dated Aug. 18, 2009, pp. 1-8, Japan.

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