Semiconductor device manufacturing: process – Making field effect device having pair of active regions... – On insulating substrate or layer
Patent
1995-06-02
1998-12-22
Niebling, John F.
Semiconductor device manufacturing: process
Making field effect device having pair of active regions...
On insulating substrate or layer
438486, H01L 2184
Patent
active
058518606
ABSTRACT:
The semiconductor device of the invention includes: a substrate having an insulating surface; an active region formed on the insulating surface of the substrate, the active region being formed by a crystalline silicon film; and an insulating thin film formed on the active region. In the semiconductor device, the active region contains a catalyst element for promoting a crystallization of an amorphous silicon film by a heat treatment.
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Funai Takashi
Makita Naoki
Booth Richard A.
Conlin David G.
Corless Peter F.
Niebling John F.
Sharp Kabushiki Kaisha
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