Semiconductor device and method for manufacturing the same

Semiconductor device manufacturing: process – Semiconductor substrate dicing – By electromagnetic irradiation

Reexamination Certificate

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C257SE21568

Reexamination Certificate

active

07851332

ABSTRACT:
A semiconductor device including a semiconductor substrate is provided. The semiconductor substrate includes a substrate having an insulating surface, and a plurality of stacks over the substrate having an insulating surface. Each of the plurality of stacks includes a bonding layer over the substrate having an insulating surface, an insulating layer over the bonding layer, and a single crystal semiconductor layer over the insulating layer. The substrate having an insulating surface has a depression, and the depression is provided between one of the plurality of stacks and another adjacent one of the plurality of stacks.

REFERENCES:
patent: 5374564 (1994-12-01), Bruel
patent: 6127702 (2000-10-01), Yamazaki et al.
patent: 6271101 (2001-08-01), Fukunaga
patent: 6303405 (2001-10-01), Yoshida et al.
patent: 6335231 (2002-01-01), Yamazaki et al.
patent: 6380046 (2002-04-01), Yamazaki
patent: 6388652 (2002-05-01), Yamazaki et al.
patent: 6602761 (2003-08-01), Fukunaga
patent: 6686623 (2004-02-01), Yamazaki
patent: 6778164 (2004-08-01), Yamazaki et al.
patent: 6803264 (2004-10-01), Yamazaki et al.
patent: 6818529 (2004-11-01), Bachrach et al.
patent: 6875633 (2005-04-01), Fukunaga
patent: RE39484 (2007-02-01), Bruel
patent: 7176525 (2007-02-01), Fukunaga
patent: 7199024 (2007-04-01), Yamazaki
patent: 7256776 (2007-08-01), Yamazaki et al.
patent: 7488667 (2009-02-01), Takeuchi et al.
patent: 2004/0104424 (2004-06-01), Yamazaki
patent: 2004/0169786 (2004-09-01), Yamazaki et al.
patent: 2005/0009252 (2005-01-01), Yamazaki et al.
patent: 2006/0292879 (2006-12-01), Takayama et al.
patent: 2007/0004082 (2007-01-01), Tsurume et al.
patent: 2007/0108510 (2007-05-01), Fukunaga
patent: 2007/0170859 (2007-07-01), Choi et al.
patent: 2007/0173000 (2007-07-01), Yamazaki
patent: 2007/0184632 (2007-08-01), Yamazaki et al.
patent: 2007/0291022 (2007-12-01), Yamazaki et al.
patent: 2008/0081400 (2008-04-01), Doi et al.
patent: 2008/0096366 (2008-04-01), Aoki et al.
patent: 2008/0268137 (2008-10-01), Ikeda et al.
patent: 2009/0174037 (2009-07-01), Choi
patent: 2010/0015782 (2010-01-01), Yu et al.
patent: 05-211128 (1993-08-01), None
patent: 11-163363 (1999-06-01), None
patent: 2003-257804 (2003-09-01), None
patent: 2005-539259 (2005-12-01), None

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