Semiconductor device and method for manufacturing...

Active solid-state devices (e.g. – transistors – solid-state diode – Field effect device – Having insulated electrode

Reexamination Certificate

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C257S646000

Reexamination Certificate

active

11475879

ABSTRACT:
A semiconductor device comprising a semiconductor substrate, a gate dielectrics formed on the semiconductor substrate and including a silicon oxide film containing a metallic element, the silicon oxide film containing the metallic element including a first region near a lower surface thereof, a second region near an upper surface thereof, and a third region between the first and second regions, the metallic element contained in the silicon oxide film having a density distribution in a thickness direction of the silicon oxide film, a peak of the density distribution existing in the third region, and an electrode formed on the gate dielectrics.

REFERENCES:
patent: 3796182 (1974-03-01), Rosler
patent: 5000113 (1991-03-01), Wang et al.
patent: 5364664 (1994-11-01), Tsubouchi et al.
patent: 6040022 (2000-03-01), Chang et al.
patent: 6146938 (2000-11-01), Saida et al.
patent: 6159854 (2000-12-01), Ohtsuka et al.
patent: 6444137 (2002-09-01), Collins et al.
patent: 6451686 (2002-09-01), Ngai et al.
patent: 6482752 (2002-11-01), Yamazaki et al.
patent: 6486080 (2002-11-01), Chooi et al.
patent: 6531354 (2003-03-01), Maria et al.
patent: 6642131 (2003-11-01), Harada
patent: 6784508 (2004-08-01), Tsunashima et al.
patent: 6962824 (2005-11-01), Basceri et al.
patent: 2002/0047169 (2002-04-01), Kunikiyo
patent: 2003/0013241 (2003-01-01), Rockwell et al.
patent: 56-61165 (1981-05-01), None
patent: 5-226608 (1993-09-01), None
patent: 5-239650 (1993-09-01), None
patent: 6-160657 (1994-06-01), None
patent: 10-308361 (1998-11-01), None
patent: 11-97683 (1999-04-01), None
patent: 11-111715 (1999-04-01), None
patent: 11-135774 (1999-05-01), None
patent: 2000-49349 (2000-02-01), None
patent: 2001-24188 (2001-01-01), None
patent: 2001-257344 (2001-09-01), None
patent: 2001-291865 (2001-10-01), None
patent: 2003-536272 (2003-12-01), None
patent: 2001-0111448 (2001-12-01), None
Japanese Patent Office Action mailed by the Japanese Patent Office on May 17, 2005 in counterpart Japanese Application No. 2002-001546.
Notification for Filing Opinion issued by the Korean Patent Office, mailed Jan. 21, 2005 in counterpart Korean Application No. 10-2005-0003200, and English translation of Notification.

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