Semiconductor device and method for fabricating the same

Details Semiconductor device and method for fabricating the same Semiconductor device and method for fabricating the same

2011-06-21

2011-06-21

Lebentritt, Michael S (Department: 2829)

Semiconductor device manufacturing: process

Coating with electrically or thermally conductive material

Insulated gate formation

C438S197000, C438S259000, C438S592000, C257SE21428, C257SE21655

Reexamination Certificate

active

07964488

ABSTRACT:
A semiconductor device includes a substrate where an isolation region and a plurality of active regions are defined, an anti-interference layer formed over the substrate in the isolation region, and a gate line simultaneously crossing the active region and the anti-interference layer.

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patent: 2007/0082442 (2007-04-01), Kim
patent: 2008/0160700 (2008-07-01), Lee
patent: 1020010063759 (2001-07-01), None
patent: 1020050035354 (2005-04-01), None

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