Semiconductor device and method for fabricating the same

Semiconductor device manufacturing: process – Forming schottky junction – Using platinum group metal

Reexamination Certificate

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C438S580000, C438S575000, C438S570000

Reexamination Certificate

active

06852612

ABSTRACT:
The semiconductor device of the present invention includes: a gallium nitride (GaN) compound semiconductor layer; and a Schottky electrode formed on the GaN compound semiconductor layer, wherein the Schottky electrode contains silicon.

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Notice of reasons of rejection (Dated May 21, 2002).

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