Active solid-state devices (e.g. – transistors – solid-state diode – Field effect device – Having insulated electrode
Reexamination Certificate
2006-03-09
2010-11-23
Pham, Thanh V (Department: 2894)
Active solid-state devices (e.g., transistors, solid-state diode
Field effect device
Having insulated electrode
C257S347000, C257S072000, C257SE21320, C438S459000, C438S155000, C438S158000
Reexamination Certificate
active
07838936
ABSTRACT:
An active matrix substrate includes a glass substrate, a driver portion formed on the glass substrate in a protruding state, a stepped portion formed along a surface of the driver portion and a surface of the glass substrate, an insulating reentrant-angle compensating film formed on a surface of the stepped portion, for compensating for at least a part of a reentrant-angle shape of the stepped portion, and a wiring layer formed along a surface of the reentrant-angle compensating film and connected to the driver portion.
REFERENCES:
patent: 6097453 (2000-08-01), Okita
patent: 2001/0011728 (2001-08-01), Gu et al.
patent: 2001/0046024 (2001-11-01), Hiraishi et al.
patent: 2002/0047159 (2002-04-01), Yamazaki et al.
patent: 2003/0193054 (2003-10-01), Hayakawa et al.
patent: 2004/0061176 (2004-04-01), Takafuji et al.
patent: 2005/0032283 (2005-02-01), Itoga et al.
patent: 2005/0106768 (2005-05-01), Onozuka et al.
patent: 2005/0179036 (2005-08-01), Yamazaki et al.
patent: 8-264796 (1996-10-01), None
patent: 2004-165600 (2004-06-01), None
patent: 2005-099409 (2005-04-01), None
International Search Report for PCT/JP2006/304616 mailed Apr. 25, 2006.
Bruel et al., “Smart-Cut: A New Silicon On Insulator Material Technology Based on Hydrogen Implantation and Wafer Bonding,” Jpn. J. Appl. Phys. vol. 36 (1997), pp. 1636-1641.
Moriguchi Masao
Takafuji Yutaka
Tomiyasu Kazuhide
Ligai Maria
Nixon & Vanderhye P.C.
Pham Thanh V
Sharp Kabushiki Kaisha
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