Semiconductor device and manufacturing method of the same

Details Semiconductor device and manufacturing method of the same Semiconductor device and manufacturing method of the same

2006-06-13

2006-06-13

Owens, Douglas W. (Department: 2811)

Active solid-state devices (e.g., transistors, solid-state diode

Fet configuration adapted for use as static memory cell

C257S904000, C257S401000, C257S368000, C257S369000

Reexamination Certificate

active

07061128

ABSTRACT:
A semiconductor device according to the present invention includes: a semiconductor substrate including an active region and an isolation region; a gate electrode formed on the active region with an oxide film interposed therebetween; and a set of impurity regions formed on both sides of the gate electrode. A surface of the active region is entirely rounded so as to be inclined downward toward the isolation region. This rounded shape can be formed by forming an isolation oxide film such that a bird's beak portion is connected on the active region.

REFERENCES:
patent: 5135882 (1992-08-01), Karniewicz
patent: 5285096 (1994-02-01), Ando et al.
patent: 5358890 (1994-10-01), Sivan et al.
patent: 5455438 (1995-10-01), Hashimoto et al.
patent: 5592013 (1997-01-01), Honda
patent: 5945715 (1999-08-01), Kuriyama
patent: 6117721 (2000-09-01), Dennison et al.
patent: 6169020 (2001-01-01), Kim et al.
patent: 6707112 (2004-03-01), Kachelmeier
patent: 1993-9059 (1993-05-01), None
patent: 5-198570 (1993-08-01), None
patent: 2000-200878 (2000-07-01), None

Affiliated with

Also associated with

Rating

Semiconductor device and manufacturing method of the same does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Semiconductor device and manufacturing method of the same, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Semiconductor device and manufacturing method of the same will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFUS-PAI-O-3697365